Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination

Microelectronic Engineering

Volumn 45, Issue 2, 1999, Pages 197-208

  Martin, A R ^a   Baeyens, M ^b   Hub, W ^c   Mertens, P W ^b   Kolbesen, B O ^a  

^a Inst of Inorg Chem/Analyt Chem   (Germany)

^b IMEC   (Belgium)

^c SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AGENTS; CHELATION; CLEANING; CONTAMINATION; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS;

CHELATING AGENT; HETEROCYCLIC COMPOUND;

SILICON WAFERS;

EID: 0032590910     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00150-1     Document Type: Article

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