Back-side reflectance of high Tc superconducting thin films in the far infrared

Applied Physics Letters

Volumn 73, Issue 13, 1998, Pages 1907-1909

  Zhang, Z M ^a   Kumar, A R ^a   Boychev, V A ^b   Tanner, D B ^b   Vale, L R ^c   Rudman, D A ^c  

^a UNIVERSITY OF FLORIDA   (United States)

^b National Institute of Standards and Technology ^*  (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; DEPOSITION; HIGH TEMPERATURE SUPERCONDUCTORS; MATHEMATICAL MODELS; OPTICAL VARIABLES MEASUREMENT; OPTICS; PULSED LASER APPLICATIONS; REFLECTION; SEMICONDUCTING SILICON; THERMAL EFFECTS; YTTRIUM BARIUM COPPER OXIDES;

BACK SIDE REFLECTANCE; PULSED LASER ABLATION; TWO FLUID MODEL;

THIN FILMS;

EID: 0032575807     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122322     Document Type: Article

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