Micro-phase separation in spread monolayers of trichloro(octadecyl)silane and its mixtures with a partially fluorinated silazane derivative

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 143, Issue 2-3, 1998, Pages 491-501

  Iimura, Ken Ichi ^a   Kato, Teiji ^a  

^a UTSUNOMIYA UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Long chain alkyltrichlorosilanes; Micro phase separation; Mixed monolayers; Spread monolayers

Indexed keywords

FLUORINE DERIVATIVE; SILANE DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; INFRARED SPECTROSCOPY; MICROSCOPY; PHASE SEPARATION; PRIORITY JOURNAL; SURFACE PROPERTY;

EID: 0032534613     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(98)00374-4     Document Type: Article

References (33)

1. G.G. Roberts, Langmuir-Blodgett Films, Plenum Press, New York, 1990.
2. A. Ulman, Introduction to Ultrathin Organic Films, Academic Press, San Diego, CA, 1991.
3. Knobler C.M. Adv. Chem. Phys. 77:1990;397.
4. Weidemann G., Vollhardt D. Langmuir. 12:1996;5114.
5. Iimura K., Suzuki N., Kato T. Bull. Chem. Soc. Jpn. 69:1996;1201.
6. Iimura K., Kato T. Mol. Cryst. Liq. Cryst. 294:1997;87.
7. Frommer J. Angew. Chem., Int. Ed. Engl. 31:1992;1298.
8. Vollhardt D., Kato T., Kawano M. J. Phys. Chem. 100:1996;4141.
9. Kato T., Kameyama M., Ehara M., Iimura K. Langmuir. 14:1998;1786.
10. Ulman A. Adv. Mater. 2:1990;573.
11. Wassermann S.R., Tao Y.-T., Whitesides G.M. Langmuir. 5:1989;1074.
12. Y. Okahata, K. Ariga, H. Nakahara, K. Fukuda, J. Chem. Soc., Chem. Commun. (1986) 1069.
13. Wolpers M., Viefhaus H., Stratmann M. Appl. Surf. Sci. 47:1991;49.
14. Kato T., Tatehana A., Suzuki N., Iimura K., Araki T., Iriyama K. Jpn. J. Appl. Phys. 34(2):1995;L911.
15. Kato T. Langmuir. 6:1990;870.
16. Kato T., Hirobe Y., Kato M. Langmuir. 7:1991;2208.
17. Kato T., Iriyama K., Araki T. Thin Solid Films. 210 211:1992;79.
18. Kato T., Tatehana A., Suzuki N. Bull. Chem. Soc. Jpn. 66:1993;1371.
19. Kato T., Matsumoto M., Kawano M., Suzuki N., Araki T., Iriyama K. Thin Solid Films. 242:1994;223.
20. Kato T., Kameyama M., Kawano M. Thin Solid Films. 273:1996;232.
21. Udagawa A., Matsui T., Tanaka S. Appl. Spectrosc. 40:1986;794.
22. Hasegawa T., Umemura J., Takenaka T. J. Phys. Chem. 97:1993;9009.
23. Shin-Etsu Chemicals Catalogue.
24. Sapper H., Cameron D.G., Mantsch H.H. Can. J. Chem. 59:1981;2543.
25. Tsukruk V.V., Bliznyuk V.N., Hazel J., Visser D. Langmuir. 12:1996;4840.
26. Fang J., Knobler C.M. J. Phys. Chem. 99:1995;10425.
27. Fang J., Knobler C.M. Langmuir. 12:1996;1368.
28. Overney R.M., Meyer E., Frommer J., Brodbeck D., Lüthi R., Howald L., Güntherodt H.-J., Fujihira M., Takano H., Gotoh Y., Frommer J. Nature. 359:1992;133.
29. Meyer E., Overney R., Lüthi R., Brodbeck D., Howald L., Güntherodt H.-J., Wolter O., Fujihira M., Takano H., Gotoh Y. Thin Solid Films. 220:1992;132.
30. Overney R.M., Meyer E., Frommer J., Güntherodt H.-J., Fujihira M., Takano H., Gotoh Y. Langmuir. 10:1994;1281.
31. K. Iimura, K. Ito, N. Suzuki, T. Kato, in preparation.
32. Keller D.J., Korb J.P., McConnell H.M. J. Phys. Chem. 91:1987;6417.
33. McConnell H.M., Moy V.T. J. Phys. Chem. 92:1988;4520.