Influence of gas environment on picosecond laser ablation sampling efficiency and ICP conditions

Analytical Chemistry

Volumn 70, Issue 22, 1998, Pages 4709-4716

  Leung, Amy P K ^a   Chan, W T ^a   Mao, X L ^b   Russo, R E ^b  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHEMICAL ANALYSIS; EMISSION SPECTROSCOPY; HELIUM; IONIZATION OF GASES; KRYPTON; LASER PRODUCED PLASMAS; NEON; SAMPLING; SHIELDING; TRACE ANALYSIS; XENON;

ATOMIC EMISSION SPECTROSCOPY SENSITIVITY; GAS ATMOSPHERE; GAS EFFECTS; INDUCTIVELY COUPLED PLASMA EXCITATION; PICOSECOND LASER ABLATION SAMPLING; PLASMA SHIELDING;

LASER ABLATION;

ARTICLE; ATOMIC EMISSION SPECTROMETRY; CORRELATION FUNCTION; GAS ANALYSIS; IONIZATION; LASER; LASER SURGERY;

EID: 0032533538     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac980336f     Document Type: Article

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