Large electrical conductivity enhancement of WO3 thin films produced by ion implantation

Journal of Applied Physics

Volumn 84, Issue 10, 1998, Pages 5610-5613

  Miyakawa, Masashi ^a,b   Kawamura, Ken Ichi ^a   Hosono, Hideo ^a   Kawazoe, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b c/o Kawazoe Hosono Laboratory ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC CONDUCTIVITY OF SOLIDS; FERMI LEVEL; HELIUM; ION IMPLANTATION; LIGHT ABSORPTION; OXIDATION; POLYCRYSTALLINE MATERIALS; PROTONS; TEMPERATURE; THIN FILMS;

MOLECULAR LEVEL MECHANISMS; POLYCRYSTALLINE TUNGSTEN TRIOXIDE THIN FILMS; TUNGSTEN BRONZE;

TUNGSTEN COMPOUNDS;

EID: 0032533108     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368608     Document Type: Article

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