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Volumn 32, Issue 20, 1998, Pages 3237-3240

A carbon arc process for treatment of CF4 emissions

Author keywords

[No Author keywords available]

Indexed keywords

CARBON ARC PROCESS; PERFLUOROCARBONS; POINT SOURCE EMISSION CONTROL;

EID: 0032532123     PISSN: 0013936X     EISSN: None     Source Type: Journal    
DOI: 10.1021/es980533w     Document Type: Article
Times cited : (18)

References (20)
  • 13
    • 84940823275 scopus 로고
    • The Cathodic Arc Plasma Deposited Thin Films
    • Vossen, J. L., Kern, W., Eds.; Academic Press: Boston, MA
    • Johnson, P. C. The Cathodic Arc Plasma Deposited Thin Films. In Thin Film Processes II; Vossen, J. L., Kern, W., Eds.; Academic Press: Boston, MA, 1991; pp 209-280.
    • (1991) Thin Film Processes II , pp. 209-280
    • Johnson, P.C.1
  • 14
    • 3543103309 scopus 로고    scopus 로고
    • E. I. du Pont deNemours and Company, U.S. Patent 2,852,574, September 16, 1958
    • Denison, J. T.; Edlin, F. E.; Whipple, G. H., E. I. du Pont deNemours and Company, U.S. Patent 2,852,574, September 16, 1958.
    • Denison, J.T.1    Edlin, F.E.2    Whipple, G.H.3
  • 15
    • 3543134914 scopus 로고    scopus 로고
    • E. I. duPont de Nemours and Company, U.S. Patent 3,081,245 March, 12, 1963
    • Farlow, M. W., E. I. duPont de Nemours and Company, U.S. Patent 3,081,245 March, 12, 1963.
    • Farlow, M.W.1
  • 16
    • 3543062412 scopus 로고    scopus 로고
    • The Dow Chemical Company, U.S. Patent 3,133,871, May 19, 1964
    • Von Tress, W. R. The Dow Chemical Company, U.S. Patent 3,133,871, May 19, 1964.
    • Von Tress, W.R.1
  • 18
    • 3543131406 scopus 로고    scopus 로고
    • Atomic Energy Corporation of South Africa Limited, European Patent EP648530A1, October 14, 1994
    • Swanepoel, J.; Lombaard, R. Atomic Energy Corporation of South Africa Limited, European Patent EP648530A1, October 14, 1994.
    • Swanepoel, J.1    Lombaard, R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.