Modeling the kinetics of neutral particles in low-pressure chemically active planar microwave plasmas

Journal of Applied Physics

Volumn 84, Issue 8, 1998, Pages 4137-4152

  Strobel, H ^a   Ohl, A ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHEMICAL REACTIONS; COMPUTER SIMULATION; DIFFERENTIAL EQUATIONS; DIFFUSION; ELECTRON ENERGY LEVELS; MIXING; OXYGEN; PLASMA DEVICES; PLASMAS; REACTION KINETICS; SURFACE TREATMENT;

BERNOULLI EQUATIONS; CONTINUOUS FLOW STIRRED TANK REACTORS; LOW PRESSURE PLANAR MICROWAVE PLASMA; NEUTRAL PARTICLE KINETICS; PLASMA SURFACE TREATMENT;

MATHEMATICAL MODELS;

EID: 0032531558     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368628     Document Type: Article

References (82)

1. S. E. Aydil and D. J. Economou, J. Electrochem. Soc. 140, 1471 (1993).
2. S. E. Coe, D. S. Bailey, J. A. Savage, and D. C. Rodway, in CVD Diamond Computer Aided Reactor Design and Progress Optimisation, edited by R. Tuck and G. Lister (Central Research Laboratories Ltd.-CRL, Hayes, U.K., 1994), pp. A1-A12.
3. E. Gogolides, D. Mary, A. Rhallabi, and G. Turban, Jpn. J. Appl. Phys., Part 1 34, 261 (1995).
4. P. L. G. Ventzek, M. Grapperhaus, and M. J. Kushner, J. Vac. Sci. Technol. B 12, 3118 (1994).
5. M. Füner, C. Wild, and P. Koidl, Surf. Coat. Technol. 74-75, 221 (1995).
6. S. E. Aydil and D. J. Economou, J. Electrochem. Soc. 139, 1396 (1992).
7. E. Gogolides, J-P. Nicolai, and H. H. Sawin, J. Vac. Sci. Technol. A 7, 1001 (1989).
8. E. Gogolides, C. Buteau, A. Rhallabi, and G. Turban, J. Phys. D 27, 818 (1994).
9. C. M. Ferreira, G. Gousset, and M. J. Touzeau, J. Phys. D 21, 1403 (1988).
10. D. P. Lymberopoulos and D. J. Economou, J. Appl. Phys. 73, 3668 (1993).
11. D. P. Lymberopoulos and D. J. Economou, J. Vac. Sci. Technol. A 12, 1229 (1994).
12. R. S. Wise, D. P. Lymperopoulos, and D. J. Economou, Plasma Sources Sci. Technol. 4, 317 (1995).
13. G. Gousset, C. M. Ferreira, M. Pinheiro, M. Touzeau, M. Vialle, P. A. Sá, and J. Loureiro, J. Appl. Phys. 24, 290 (1991).
14. M. J. Hartig and M. J. Kushner, J. Appl. Phys. 73, 1080 (1993).
15. R. C. Koemtzopoulos, D. J. Economou, and R. Pollard, Diamond Relat. Mater. 2, 25 (1993).
16. P. A. Sá, J. Loureiro, and C. M. Ferreira, J. Phys. D 25, 960 (1992).
17. P. A. Sá, J. Loureiro, and C. M. Ferreira, J. Phys. D 27, 1171 (1994).
18. R. Winkler, J. Wilhelm, M. Capitelli, and C. Gorse, Plasma Chem. Plasma Process. 12, 71 (1992).
19. R. E. P. Harvey, W. N. G. Hitchon, and G. J. Parker, J. Appl. Phys. 75, 1940 (1994).
20. C. Lee, D. B. Graves, M. A. Lieberman, and D. W. Hess, J. Electrochem. Soc. 141, 1546 (1994).
21. J. A. G. Baggerman, E. J. H. Collart, and R. J. Visser, J. Appl. Phys. 71, 5799 (1992).
22. J. A. G. Baggerman, R. J. Visser, and E. J. H. Collart, J. Appl. Phys. 75, 758 (1994).
23. P. J. Stout and M. J. Kushner, J. Vac. Sci. Technol. A 11, 2562 (1993).
24. J. P. Boeuf and L. C. Pitchford, Phys. Rev. E 51, 1376 (1995).
25. M. J. Pinheiro and C. M. Ferreira, in Book of Invited Papers: 10th Symposium on elementary processes and chemical reactions in low temperature plasma, Stara Lesna, High Tatras, Slovakia, Sept. 5-9, 1994, edited by M. Morvová and P. Lukác (Physical Scientific Section of the Union of Slovak Mathematicians and Physicists (FVS JSMF), Bratislava, and Department of Plasma Physics, Institute of Physics, Faculty of Mathematics and Physics, Comenius University, Bratislava, Bratislava, 1994) pp. 27-43.
26. G. J. Parker, W. N. G. Hitchon, and J. E. Lawler, J. Comput. Phys. 106, 147 (1993).
27. R. Winkler and J. Wilhelm, Phys. Scr. 23, 264 (1988).
28. Yu. L. Klimontovich, Zh. Exsp. Teor. Fiz. 52, 1233 (1967).
29. Yu. L. Klimontovich, Contrib. Plasma Phys. 33, 421 (1993).
30. D. J. Economou, T. J. Bartel, R. S. Wise, and D. P. Lymberopoulos, IEEE Trans. Plasma Sci. 23, 581 (1995).
31. W. N. G. Hitchon, G. J. Parker, and J. E. Lawler, IEEE Trans. Plasma Sci. 21, 228 (1993).
32. M. J. Kushner and D. B. Graves, IEEE Trans. Plasma Sci. 19, No. 2 (1991).
33. G. G. Lister, J. Phys. D 25, 1649 (1992).
34. G. G. Lister, Vacuum 45, 525 (1994).
35. A. Ohl, in Microwave Discharges: Fundamentals and Applications, edited by C. M. Ferreira and M. Moisan (Plenum, New York, 1993), pp. 205-214.
36. A. Ohl, H. Strobel, J. Röpcke, H. Kammerstetter, A. Pries, and M. Schneider, Surf. Coat. Technol. 74-75, 59 (1994).
37. K. Böttcher, S. Pfau, H. Sabadil, and H.-E. Wagner, Wiss. Z. Ernst-Moritz-Arndt-Univ. Greifsw., Math.-Naturwiss. Reihe 35, 23 (1986).
38. H. Jacobs, F. Miethke, A. Rutscher, and H.-E. Wagner, Contrib. Plasma Phys. 36, 471 (1996).
39. H. Strobel and A. OhI, in XXI International Conference on Phenomena in Ionized Gases (ICPIG), September 19-24, 1993, Proceedings, Bochum, Vol. I, edited by G. Ecker, U. Arendt, and J. Böseler (Arbeitsgemeinschaft Plasmaphysik-APP, Ruhr-Universität, Bochum, 1993), pp. 119-120.
40. J. Röpcke and A. OhI, Contrib. Plasma Phys. 34, 575 (1994).
41. A. Ohl and J. Röpcke, Diamond Relat. Mater. 1, 243 (1992).
42. A. Ohl, J. Röpcke, and W. Schleinitz, Diamond Relat. Mater. 2, 298 (1993).
43. M. Käning, Dissertation, Ernst-Moritz-Arndt-Universität, Greifswald, 1996.
44. A. T. Bell, in Techniques and Applications of Plasma Chemistry, edited by J. R. Hollahan and A. T. Bell (Wiley, New York, 1974), Chap. 1, pp. 1-56.
45. H. Sabadil, Beitr. Plasmaphys. 34, 54 (1971).
46. R. Aris, Introduction to the Analysis of Chemical Reactors (Prentice-Hall, Englewood Cliffs, NJ, 1965).
47. C. Chicone and D. G. Retzloff, Nonlinear Analysis: Theory, Methods & Applications; Internat. Multidisciplinary Journal 9, 983 (1982).
48. K. G. Denbigh and J. C. R. Turner, Chemical Reactor Theory (Cambridge University Press, Cambridge, U.K., 1984).
49. G. R. Gavalas, Nonlinear Differential Equations of Chemical Reacting Systems (Springer, Berlin, 1968).
50. P. Gray and S. K. Scott, Chemical Oscillations and Instabilities. Non-linear Chemical Kinetics (Clarendon, Oxford, 1990).
51. D. V. Jorgensen, W. W. Farr, and R. Aris, Chem. Eng. Sci. 39, 1741 (1984).
52. D. D. Perlmutter, Stability of Chemical Reactors (Prentice-Hall, Englewood Cliffs, NJ, 1972).
53. E. E. Peterson, Chemical Reaction Analysis (Prentice-Hall, Englewood Cliffs, NJ, 1965).
54. R. B. Bird, W. E. Stewart, and E. N. Lightfoot, Transport Phenomena (Wiley, New York, 1960), p. 212.
55. K. Hutter, Fluid- und Thermodynamik. Eine Einführung (Springer, Berlin, 1995), p. 80.
56. R. W. McCullough, J. Geddes, A. Donnelly, M. Liehr, M. P. Hughes, and H. B. Gilbody, Meas. Sci. Technol. 4, 79 (1993).
57. H. A. Bethe and E. E. Salpeter, in Handbuch der Physik, Band 35, Atome 1, edited by S. Flügge (Springer, Berlin, 1957).
58. A. von Engel, Electric Plasmas: Their Nature and Uses (Taylor & Francis, London, 1983).
59. A. T. Bell and K. Kwong, AIChE. J. 18, 990 (1972).
60. A. T. Bell, in Techniques and Applications of Plasma Chemistry, edited by J. R. Hollahan and A. T. Bell (Wiley, New York, 1974), Chap. 10, pp. 379-391.
61. A. Donnelly, M. P. Hughes, J. Geddes, and H. B. Gilbody, Meas. Sci. Technol. 3, 528 (1992).
62. J. Geddes, R. W. McCullough, A. Donnelly, and H. B. Gilbody, Plasma Sources Sci. Technol. 2, 93 (1993).
63. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, Plasma Sources Sci. Technol. 1, 36 (1992).
64. U. Kortshagen, A. Shivarova, E. Tatarova, and D. Zamfirov, J. Phys. D 27, 301 (1994).
65. F. Kaufman, in Progress in Reaction Kinetics, edited by G. Porter and B. Stevens (Pergamon, Oxford, 1961), Vol. 1, pp. 1-40.
66. S. Chapman and T. G. Cowling, Mathematical Theory of Non-uniform Gases, 2nd ed. (Cambridge University Press, Cambridge, 1951).
67. J. O. Hirschfelder, C. F. Curtiss, and R. B. Bird, Molecular Theory of Gases and Liquids (Wiley, New York, 1954).
68. P. W. Atkins, Physical Chemistry, 4th ed. (Oxford University Press, Oxford, 1990).
69. H. V. Boening, Fundamentals of Plasma Chemistry and Technology (Technomic, Lancaster, PA, 1988).
70. E. J. Collart, J. A. Baggerman, and R. J. Visser, J. Appl. Phys. 78, 47 (1995).
71. C.-H. Chou, T.-C. Wei, and J. Phillips, J. Appl. Phys. 72, 870 (1992).
72. J. D'Ans and E. Lax, Taschenbuch für Physiker und Chemiker, Bd. 1, Physikalisch-Chemische Daten (Springer, Berlin, 1992); ibíd., Bd. 2, Organische Verbindungen (Springer, Berlin, 1983).
73. J. D'Ans and E. Lax, Taschenbuch für Physiker und Chemiker, Bd. 1, Physikalisch-Chemische Daten (Springer, Berlin, 1992); ibíd., Bd. 2, Organische Verbindungen (Springer, Berlin, 1983).
74. D. L. Flamm and G. K. Herb, in Plasma Etching, edited by D. M. Manos and D. L. Ramm (Academic, San Diego, CA, 1989), pp. 1-90.
75. D. L. Flamm, in Plasma Etching, edited by D. M. Manos and D. L. Flamm (Academic, San Diego, CA, 1989), pp. 91-184.
76. M. Hudis, in Techniques and Applications of Plasma Chemistry, edited by J. R. Hollahan and A. T. Bell (Wiley, New York, 1974), Chap. 3, pp. 113-147.
77. H. Kersten and G. M. W. Kroesen, Contrib. Plasma Phys. 30, 725 (1990).
78. D. R. Lide, CRC Handbook of Chemistry and Physics, 73rd ed. (CRC, Boca Raton, FL, 1992).
79. F. K. McTaggart, Plasma Chemistry in Electrical Discharges (Elsevier, New York, 1967).
80. A. J. van Roosmalen, J. A. G. Baggerman, and S. J. H. Brader, Dry Etching for VLSI (Plenum, New York, 1991).
81. H. Wise and B. J. Wood, in Advances in Atomic and Molecular Physics, edited by D. R. Bates and I. Estermann (Academic, New York, 1967), Vol. 3, pp. 291-353.
82. J. C. Martz, D. W. Hess, and E. E. Petersen, J. Appl. Phys. 72, 3289 (1992).