The absorbance deviation method: A spectrophotometric estimation of the critical micelle concentration (CMC) of ethoxylated alkylphenol surfactants

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 137, Issue 1-3, 1998, Pages 189-196

  Ysambertt, F ^a,b   Vejar, F ^a   Paredes, J ^b   Salager, J L ^a  

^a UNIVERSIDAD DE LOS ANDES   (Venezuela)

^b UNIVERSIDAD DEL ZULIA   (Venezuela)

Author keywords

Critical micelle concentration; Ethoxylated alkylphenol; Spectrophotometry

Indexed keywords

ABSORPTION SPECTROSCOPY; CRITICAL MICELLE CONCENTRATION; PHENOLS; SPECTROPHOTOMETRY;

ETHOXYLATED ALKYLPHENOL SURFACTANTS;

SURFACE ACTIVE AGENTS;

ALKYLPHENOL; SURFACTANT;

ABSORPTION SPECTROPHOTOMETRY; ARTICLE; MICELLE; PRIORITY JOURNAL; SOLUBILIZATION; SURFACE PROPERTY; SURFACE TENSION;

EID: 0032526158     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(97)00203-3     Document Type: Article

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