Electron beam induced x-ray emission: An in situ probe for composition determination during molecular beam epitaxy growth

Applied Physics Letters

Volumn 73, Issue 24, 1998, Pages 3580-3582

  Pellegrino, Joseph G ^a   Armstrong, John ^a   Lowney, Jeremiah ^a   Dicamillo, Barbara ^a   Woicik, Joseph C ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE EMISSION; ELECTRONS; EPITAXIAL GROWTH; MECHANICAL PROPERTIES; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SPECTRUM ANALYSIS; STRUCTURE (COMPOSITION);

ELECTRON BEAM INDUCED X RAY EMISSION; MOLECULAR BEAM EPITAXY GROWTH;

ELECTRON BEAMS;

EID: 0032517722     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122830     Document Type: Article

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