Control of dispersion of Ni2+ ions via chelate ligands in the preparation of Ni/SiO2 materials. A XAFS study

Journal of the American Chemical Society

Volumn 120, Issue 9, 1998, Pages 2059-2070

  Carriat, J Y ^a,c   Che, M ^a,b   Kermarec, M ^a   Verdaguer, M ^d   Michalowicz, A ^e,f  

^a UNIVERSITÉ PIERRE ET MARIE CURIE   (France)

^b INSTITUT UNIVERSITAIRE DE FRANCE   (France)

^c TOTAL   (France)

^d CNRS   (France)

^e Lab Phys Milieux Desordonnes F   (France)

^f UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CHELATE; ETHYLENEDIAMINE; LIGAND; NICKEL; SILICATE; SILICON DIOXIDE; UREA;

ADSORPTION; AQUEOUS SOLUTION; ARTICLE; CATALYST; CHEMICAL REACTION; COMPLEX FORMATION; CONTROLLED STUDY; DISPERSION; PRECIPITATION; REDUCTION; SPECTROSCOPY; TEMPERATURE;

EID: 0032507268     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja9725561     Document Type: Article

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