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Volumn 415, Issue 3, 1998, Pages 363-375
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Epitaxial growth of Cu onto Si(111) surfaces at low temperature
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Author keywords
Copper; Electron solid diffraction; Epitaxy; Metal semiconductor interfaces; Metal semiconductor nonmagnetic thin film structures; Metallic films; Molecular beam epitaxy; Reflection high energy electron diffraction (RHEED); Silicon; Single crystal epitaxy
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Indexed keywords
COPPER;
INTERFACES (MATERIALS);
METALLIC FILMS;
MOLECULAR BEAM EPITAXY;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SEMICONDUCTING SILICON;
SINGLE CRYSTALS;
SUPERLATTICES;
SURFACES;
ELECTRON SOLID DIFFRACTION;
METAL SEMICONDUCTOR INTERFACES;
METAL SEMICONDUCTOR NONMAGNETIC THIN FILM STRUCTURES;
SINGLE CRYSTAL SURFACES;
SOLID PHASE EPITAXY;
SURFACE DEFECTS;
EPITAXIAL GROWTH;
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EID: 0032500411
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(98)00572-X Document Type: Article |
Times cited : (29)
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References (28)
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