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Volumn 415, Issue 3, 1998, Pages 363-375

Epitaxial growth of Cu onto Si(111) surfaces at low temperature

Author keywords

Copper; Electron solid diffraction; Epitaxy; Metal semiconductor interfaces; Metal semiconductor nonmagnetic thin film structures; Metallic films; Molecular beam epitaxy; Reflection high energy electron diffraction (RHEED); Silicon; Single crystal epitaxy

Indexed keywords

COPPER; INTERFACES (MATERIALS); METALLIC FILMS; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SUPERLATTICES; SURFACES;

EID: 0032500411     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00572-X     Document Type: Article
Times cited : (29)

References (28)
  • 11
    • 0001662083 scopus 로고
    • G. Meyer, K.H. Rieder, Surf. Sci. 64 (24)25) (1994) 3560 Surf. Sci. 331 (1995) 600.
    • (1994) Surf. Sci. , vol.64 , Issue.24-25 , pp. 3560
    • Meyer, G.1    Rieder, K.H.2
  • 12
    • 0029346197 scopus 로고
    • G. Meyer, K.H. Rieder, Surf. Sci. 64 (24)25) (1994) 3560 Surf. Sci. 331 (1995) 600.
    • (1995) Surf. Sci. , vol.331 , pp. 600
  • 16
    • 0003105092 scopus 로고
    • X. Xie, S.Y. Tong, M.A. Van Hove (Eds.), World Scientific, Singapore
    • Z.H. Zhang, S. Hasegawa, S. Ino, in: X. Xie, S.Y. Tong, M.A. Van Hove (Eds.), The Structure of Surface IV, World Scientific, Singapore, 1994, p. 367.
    • (1994) The Structure of Surface IV , vol.4 , pp. 367
    • Zhang, Z.H.1    Hasegawa, S.2    Ino, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.