Epitaxial growth of CeO2(1 0 0) films on Si(1 0 0) substrates by dual ion beams reactive sputtering

Solid State Communications

Volumn 108, Issue 4, 1998, Pages 225-227

  Kang, J F ^a   Xiong, G C ^a   Lian, G J ^a   Wang, Y Y ^a   Han, R Q ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

A. insulators; A. thin films; B. epitaxy; E. X ray spectroscopies

Indexed keywords

CERIUM COMPOUNDS; CRYSTAL ORIENTATION; FILM GROWTH; INSULATING MATERIALS; ION BEAMS; SEMICONDUCTING SILICON; SPUTTERING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CERIUM DIOXIDE; DUAL ION BEAM REACTIVE SPUTTERING;

EPITAXIAL GROWTH;

EID: 0032500267     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(98)00353-6     Document Type: Article

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