Preparation and ferroelectric properties of BaTiO3 thin films by atmospheric-pressure metalorganic chemical vapor deposition

Thin Solid Films

Volumn 322, Issue 1-2, 1998, Pages 104-107

  Zeng, Jianming ^a,b   Wang, Hong ^b   Wang, Ming ^b   Shang, Suxia ^b   Wang, Zuo ^b   Lin, Chenglu ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b SHANDONG UNIVERSITY   (China)

Author keywords

Atmospheric pressure metalorganic chemical vapor deposition; Coercive field; Ferroelectric thin film; Rapid thermal annealing; Remanent polarization; Tensile stress

Indexed keywords

ANNEALING; ATMOSPHERIC PRESSURE; BARIUM TITANATE; COERCIVE FORCE; CRYSTAL ORIENTATION; FERROELECTRIC MATERIALS; FILM PREPARATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; POLYCRYSTALLINE MATERIALS; SILICON; THIN FILMS;

CURIE TEMPERATURE;

DIELECTRIC FILMS;

EID: 0032496508     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00965-6     Document Type: Article

References (22)

1. S. Fushimi, Kagakukogyo 25 (1981) 191.
2. A.M. Glass, Science 235 (1987) 1003.
3. S.E. Wemple, M. Didomenico Jr., I. Canlible, J. Phys. Chem. Solids 29 (1968) 1797.
4. K. Noshimoto, D.L. Fork, Appl. Phys. Lett. 60 (1990) 10.
5. M.B. Lee, M. Kawaki, M. Yosjimoto, B. Moon, H. Ishiwara, H. Konuma, Jpn. J. Appl. Phys. 34 (1995) 868.
6. R.D. Nawathey, S.M. Vispute, S.M. Chaudhari, Kanetakar, S.B. Ogale, Solid State Commun. 71 (1989) 9.
7. M.G. Norton, C.B. Carter, J. Mater. Res. 5 (1990) 2762.
8. Y. Yano, K. Lijima, Y. Daitoh, T. Terashima, Y. Bando, J. Appl. Phys. 76 (1994) 12.
9. T. Hayashi, N. Ohji, K. Hirohara, T. Fukumaga, H. Maiwa, Jpn. J. Appl. Phys. 2 (1993) 4092.
10. H. Maiwa, N. Ichinose, K. Okahara, Jpn. J. Appl. Phys. 33 (1994) 5223.
11. B.S. Kwak, K. Zhang, E.P. Boyd, A. Erbil, J. Appl. Phys. 69 (1991) 2.
12. H. Nakzawa, H. Yamani, T. Hirai, Jpn. J. Appl. Phys. 30 (1991) 2200.
13. I.T. Kim, C.H. Lee, S.J. Park, Jpn. J. Appl. Phys. 33 (1994) 5125.
14. T.W. Kim, S.S. Yom, Appl. Phys. Lett. 65 (1994) 15.
15. J.M. Zeng, H. Wang, S.X. Shang et al., J. Cryst. Growth, 1996 (to be published).
16. B.D. Cullity, Elements of X-ray Diffraction, 2nd edn., Addison-Wesley, 1978.
17. L.K. Templeton, J.A. Pask, J. Am. Ceram. Soc. 42 (1959) 212.
18. D.E. Rase, R. Roy, J. Am. Ceram. Soc. 38 (1955) 102.
19. A. Turik, Bull. Acad. Sci. USSR Phys. Ser. 29 (1965) 91.
20. K. Amanuma et al., Jpn. J. Appl. Phys. 32 (1993) 4150.
21. M.B. Lee et al., Jpn. J. Appl. Phys. 34 (1995) 808.
22. R. Vest, Ferroelectrics 53 (1990) 102.