Synthesis of Sn-doped a-C:H films by RF plasma-enhanced chemical vapor deposition and their characterization

Thin Solid Films

Volumn 322, Issue 1-2, 1998, Pages 41-45

  Inoue, Yasushi ^a   Komoguchi, Tetsuya ^a   Nakata, Hidenao ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Amorphous materials; Carbon; Plasma processing and deposition; X ray photoelectron spectroscopy

Indexed keywords

ARGON; CARBON; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; ETCHING; HYDROGENATION; PRESSURE EFFECTS; SYNTHESIS (CHEMICAL); TIN; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL SHIFT; ORGANOTIN COMPOUNDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

AMORPHOUS FILMS;

EID: 0032496492     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00937-1     Document Type: Article

References (18)

1. H.-C. Tsai, D.B. Bogy, J. Vac. Sci. Technol. A5 (1987) 3287.
2. S.R.P. Silva, Thin Solid Films 270 (1995) 194.
3. J.U. Thiele, B. Rubarth, P. Hamer, A. Helmbold, B. Kessler, K. Rohwer, D. Meissner, Diamond Related Mater. 3 (1994) 1103.
4. J. Schwan, W. Dworschak, K. Jung, H. Ehrhardt, Diamond Related Mater. 3 (1994) 1034.
5. G. Sreenivas, S.S. Ang, W.D. Brown, J. Electronic Mater. 23 (1994) 569.
6. M. Grischke, K. Bewilogua, K. Trojan, H. Dimigen, Surf. Coat. Technol. 739 (1995) 74-75.
7. J.U. Thiele, P. Oelhafen, Solid State Commun. 93 (1995) 29.
8. D. Briggs, J.C. Liviere, in: D. Briggs, M.P. Seah (Eds.), Practical Surface Analysis, Appendix 6, Vol. 1, Wiley, Chichester, New York, 1990, p. 635.
9. H. Ihara, Y. Kumashiro, A. Itoh, K. Maeda, Jpn. J. Appl. Phys. 12 (1973) 1462.
10. I.N. Shabanova, V.A. Trapeznikov, J. Electron Spectrosc. Related Phen. 6 (1975) 297.
11. J.A.T. Verhoeven, H. Van Doveren, Surf. Sci. 123 (1982) 369.
12. I. Kusunoki, Y. Igari, Appl. Surf. Sci. 59 (1992) 95.
13. K. Siegbahn, ESCA Applied to Free Molecules, North Holland, Amsterdam (1969).
14. XPS data set, Shimadzu-Kratos, Kyoto.
15. S.T. Jackson, R.G. Nuzzo, Appl. Suf. Sci. 90 (1995) 195.
16. T.T.P. Cheung, J. Appl. Phys. 53 (1982) 6857.
17. C.D. Wagner, L.H. Gale, R.H. Raymond, Anal. Chem. 51 (1979) 466.
18. Y. Inoue, O. Takai, Proc. Symp. Plasma Sci. Mater. 9 (1996) 39.