Simple method of fabricating polarisation-insensitive and very low crosstalk AWG grating devices

Electronics Letters

Volumn 34, Issue 1, 1998, Pages 78-79

  Ojha, S M ^a   Cureton, C ^a   Bricheno, T ^a   Day, S ^a   Moule, D ^a   Bell, A J ^a   Taylor, J ^a  

^a NORTEL NETWORKS   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CROSSTALK; FREQUENCY DIVISION MULTIPLEXING; LIGHT POLARIZATION; OPTICAL WAVEGUIDES; OXIDES; PLASMA APPLICATIONS; SILICON WAFERS; SUBSTRATES; THERMAL EXPANSION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); THERMAL EXPANSION COEFFICIENTS;

DIFFRACTION GRATINGS;

EID: 0032495447     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19980079     Document Type: Article

References (6)

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3. INOUE, Y., OHMORI, Y., KAWACHI, M., ANDO, S., SAWADA, T., and TAKAHASHI, H.: 'Polarization mode converter with polyimide half waveplate in silica based planar light wave circuits', IEEE Photonics Technol. Lett., 1994, 6, (5), pp. 626-628
4. KAWACHI, M.: 'Silica waveguides on silicon and their application to integratedoptic components', Opt. Quantum Electron., 1990, 22, pp. 391-416
5. 2-Si', IEEE Photonics Technol. Lett., 1995, 7, (10), pp. 1040-1041
6. SUZUKI, S., SUMIDA, S., INDUE, Y., and OHMORI, Y.: 'Polarisation insensitive arrayed-waveguide gratings using dopant-rich silicabased glass with thermal expansion adjusted to Si substrate', Electron. Lett., 1997, 33, (13), pp. 1173-1174