Photodegradation of teflon AF1600 during XPS analysis

Journal of Applied Polymer Science

Volumn 70, Issue 6, 1998, Pages 1201-1207

  Popovici, D ^a   Sacher, E ^a   Meunier, M ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Fluoropolymer; Mass spectroscopy; Photodegradation; Teflon AF; X ray photoelectron spectroscopy

Indexed keywords

AROMATIC POLYMERS; CHEMICAL BONDS; CROSSLINKING; DEGRADATION; FREE RADICALS; MASS SPECTROMETRY; PHOTOCHEMICAL REACTIONS; REACTION KINETICS; X RAY PHOTOELECTRON SPECTROSCOPY;

X RAY FILAMENT EMISSION CURRENTS;

POLYTETRAFLUOROETHYLENES;

EID: 0032494671     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1097-4628(19981107)70:6<1201::AID-APP17>3.0.CO;2-1     Document Type: Article

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