Alloying and electrical properties of evaporated Cu-In bilayer thin films

Thin Solid Films

Volumn 334, Issue 1-2, 1998, Pages 192-195

  Nakano, Takeo ^a   Suzuki, Takehiro ^a   Ohnuki, Noriyuki ^a   Baba, Shigeru ^a  

^a SEIKEI UNIVERSITY   (Japan)

Author keywords

Alloy; Copper; Hall coefficient; Indium

Indexed keywords

ANNEALING; BINARY ALLOYS; COPPER ALLOYS; ELECTRIC CONDUCTIVITY OF SOLIDS; EVAPORATION; HALL EFFECT; INTERMETALLICS; METALLOGRAPHIC MICROSTRUCTURE; THERMAL EFFECTS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SEQUENTIAL VACUUM DEPOSITION;

METALLIC FILMS;

EID: 0032483871     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01142-0     Document Type: Article

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