Micromachining of pure silicon by molecular dynamics

Thin Solid Films

Volumn 334, Issue 1-2, 1998, Pages 221-224

  Nozaki, Tadatoshi ^a   Doyama, Masao ^a   Kogure, Yoshiaki ^a   Yokotsuka, Tatsuo ^b  

^a TEIKYO UNIVERSITY OF SCIENCE   (Japan)

^b Matsushita Research Institute Tokyo Inc   (Japan)

Author keywords

Computer simulation; Micro tribology; Molecular dynamics; Silicon

Indexed keywords

CRYSTAL ORIENTATION; DISLOCATIONS (CRYSTALS); MICROMACHINING; MOLECULAR DYNAMICS; PLASTIC DEFORMATION; SILICON; SINGLE CRYSTALS; SURFACE ROUGHNESS;

STILLINGER-WEBER POTENTIAL;

METALLIC FILMS;

EID: 0032483867     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01148-1     Document Type: Article

References (4)

1. F.H. Stillinger, T.A. Weber, Phys. Rev. B31 (1985) 5262.
2. F.H. Stillinger, T.A. Weber, J. Phys. Chem. 87 (1983) 2833.
3. F.H. Stillinger, T.A. Weber, J. Chem. Phys. 80 (1984) 4434.
4. T. Uchida, T. Yokotsuka, M. Doyama, in: S. Nishijima, H. Onodera (Eds.), Modelling and Simulation for Materials Design, National Research Institute for Metals, Tsukuba, Japan, 1996, p. 209.