A plasma kinetics model: Analysis of wall loss reactions in dry etching of silicon dioxide

Journal of Alloys and Compounds

Volumn 279, Issue 1, 1998, Pages 60-65

  Tago, Kazutami ^a   Kazumi, Hideyuki ^a   Kobayashi, Kinya ^a  

^a HITACHI LTD   (Japan)

Author keywords

Composition; Plasma chemistry; Surface reaction

Indexed keywords

ADSORPTION; DISSOCIATION; MATHEMATICAL MODELS; PLASMA DENSITY; PLASMA ETCHING; REACTION KINETICS; SURFACE PHENOMENA; SURFACE STRUCTURE;

PLASMA CHEMISTRY; STICKING COEFFICIENT;

SILICA;

EID: 0032483285     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(98)00612-4     Document Type: Article

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