Finite element simulation of a layout optimisation technique by photoelastic stress minimisation

Finite Elements in Analysis and Design

Volumn 28, Issue 4, 1998, Pages 277-292

  Tranxuan, Danh ^a  

^a School of Communications and Informatic   (Australia)

Author keywords

Finite element method; Layout optimisation; Optimisation of structures; Optimum design; Optimum profile; Photoelastic stress minimisation; Simulation; Stress concentration; Stress minimisation

Indexed keywords

COMPUTER SIMULATION; OPTIMIZATION; PHOTOELASTICITY; STIFFNESS MATRIX; STRESS ANALYSIS; STRESS CONCENTRATION; STRESS INTENSITY FACTORS; STRUCTURAL DESIGN;

PHOTOELASTIC STRESS MINIMIZATION;

FINITE ELEMENT METHOD;

EID: 0032481554     PISSN: 0168874X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-874X(97)00040-1     Document Type: Article

References (6)

1. G.I.N. Rozvany, M.P. Bendsoe, U. Kirsh, Layout optimization of structures, Appl. Mech. Rev. 48 (2) (1995) 41-119.
2. R.B. Heywood, Designing against Fatigue of Metal, Reinhold, New York, 1962.
3. R.B. Heywood, Photoelasticity for Designers, Pergamon Press, Oxford, 1969.
4. A.J. Durelli, K. Rajaia, Minimising Stress and Photoelasticity, Machine Design 53 (28) (1981) 125-130.
5. D. Tranxuan, Where Textbook Results are not available, ANSYS has the Solution, ANSYS News 3 (1995) 12-13.
6. Y.M. Xie, G.P. Steven, A simple evolutionary procedure for structural optimisation, Comput. Struct. 49 (5) (1993) 885-896.