MOCVD of zirconia thin films by direct liquid injection using a new class of zirconium precursor

Advanced Materials

Volumn 10, Issue 4, 1998, Pages 46-49

  Jones, Anthony C ^a   Leedham, Timothy J ^a   Wright, Peter J ^a   Crosbie, Michael J ^a   Lane, Penelope A ^a   Williams, Dennis J ^a   Fleeting, Kirsty A ^a   Otway, David J ^a   O'Brien, Paul ^a  

^a Inorgtech Limited   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THERMODYNAMIC STABILITY; THIN FILMS; X RAY SPECTROSCOPY;

COMPOSITIONAL UNIFORMITY; ENERGY DISPERSED X RAY SPECTROSCOPY; LIQUID INJECTION; ZIRCONIUM PRECURSOR;

ZIRCONIA;

EID: 0032481550     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (18)