Mechanisms of self-ordering of nanostructures in nonplanar OMCVD growth

Journal of Crystal Growth

Volumn 195, Issue 1-4, 1998, Pages 596-602

  Biasiol, G ^a   Lelarge, F ^a   Leifer, K ^a   Kapon, E ^a  

^a EPFL   (Switzerland)

Author keywords

Monte Carlo simulations; OMCVD; Self ordering; Surface diffusion; Surface energy

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; CRYSTAL ORIENTATION; DIFFUSION IN SOLIDS; ENTROPY; INTERFACIAL ENERGY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR QUANTUM WIRES;

CHEMICAL POTENTIAL GRADIENTS; SELF-LIMITING GROWTH;

SEMICONDUCTOR GROWTH;

EID: 0032477139     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(98)00634-4     Document Type: Article

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