Universal fit formula for electronic stopping of all ions in carbon and silicon

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 146, Issue 1-4, 1998, Pages 106-113

  Konac, G ^a   Klatt, Ch ^a   Kalbitzer, S ^a  

^a MAX PLANCK INSTITUT FÜR KERNPHYSIK   (Germany)

Author keywords

Electronic stopping power; Ion beams; Ion implantation

Indexed keywords

CARBON; ELECTRON ENERGY LEVELS; ION IMPLANTATION; SILICON; TARGETS;

ATOMIC NUMBER; ELECTRONIC STOPPING;

ION BEAMS;

EID: 0032476989     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00453-4     Document Type: Article

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