Deposition of tungsten thin films by dual frequency inductively coupled plasma assisted CVD

Thin Solid Films

Volumn 332, Issue 1-2, 1998, Pages 21-24

  Colpo, Pascal ^a   Rossi, François ^a   Gibson, Neil ^a   Gilliland, Douglas ^a  

^a JOINT RESEARCH CENTRE   (Italy)

Author keywords

Hard coating; Inductively coupled plasmas; Plasma enhanced chemical vapor deposition; Thin films; Tungsten

Indexed keywords

CHEMICAL REACTORS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CURRENT DENSITY; HARD FACING; HIGH PASS FILTERS; INDUCTION HEATING; LOW PASS FILTERS; METALLOGRAPHIC MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; TUNGSTEN;

HARD COATINGS; INDUCTIVELY COUPLED PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION;

METALLIC FILMS;

EID: 0032476288     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01035-9     Document Type: Article

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