|
Volumn 193, Issue 1-2, 1998, Pages 23-27
|
The dependence of growth rate of GaN buffer layer on growth parameters by metalorganic vapor-phase epitaxy
|
Author keywords
GaN buffer layer; Growth parameters; Growth rate; MOVPE
|
Indexed keywords
ATMOSPHERIC PRESSURE;
CHEMICAL REACTORS;
METALLORGANIC VAPOR PHASE EPITAXY;
SAPPHIRE;
SEMICONDUCTING GALLIUM COMPOUNDS;
THERMAL EFFECTS;
BUFFER LAYER;
GROWTH PARAMETER;
GROWTH RATE;
LASER REFLECTANCE;
MOLAR FLOW RATE;
SEMICONDUCTOR GROWTH;
|
EID: 0032475365
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(98)00476-X Document Type: Article |
Times cited : (8)
|
References (13)
|