O 2 plasma oxidation of sputter-deposited Cu thin film during photo resist ashing

Applied Surface Science

Volumn 135, Issue 1-4, 1998, Pages 101-106

  Kwon, Myoung Seok ^a   Lee, Jeong Yong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Copper oxide; Copper thin film; Plasma oxidation

Indexed keywords

COPPER; COPPER OXIDES; HIGH TEMPERATURE PROPERTIES; PHOTORESISTS; PLASMA APPLICATIONS; SPUTTER DEPOSITION; SURFACE TOPOGRAPHY; SURFACE TREATMENT; THERMOOXIDATION; THIN FILMS;

PHOTORESIST ASHING; PLASMA OXIDATION;

METALLIC FILMS;

EID: 0032475356     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00266-9     Document Type: Article

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