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Volumn 394, Issue 6688, 1998, Pages 49-52

Nanofabrication of solidstate fresnel lenses for electron optics

Author keywords

[No Author keywords available]

Indexed keywords

NANOPARTICLE;

EID: 0032474775     PISSN: 00280836     EISSN: None     Source Type: Journal    
DOI: 10.1038/27863     Document Type: Article
Times cited : (33)

References (11)
  • 1
    • 0002170585 scopus 로고
    • The theoretical resolution of the electron microscope
    • Scherzer, O. The theoretical resolution of the electron microscope. J. Appl. Phys. 20, 20-29 (1949).
    • (1949) J. Appl. Phys. , vol.20 , pp. 20-29
    • Scherzer, O.1
  • 2
    • 0006350685 scopus 로고
    • (ed. Sturgess, J. M.) Microscopical Society of Canada
    • Broers, A. N. et al. in Electron Microscopy 1978 Vol. III (ed. Sturgess, J. M.) 343-354 (Microscopical Society of Canada, 1978).
    • (1978) Electron Microscopy 1978 , vol.3 , pp. 343-354
    • Broers, A.N.1
  • 3
    • 0019636721 scopus 로고
    • In-situ vaporization of very low-molecular weight resists using 1-2 nm diameter electron beams
    • Isaacson, M. & Muray, A. In-situ vaporization of very low-molecular weight resists using 1-2 nm diameter electron beams. J. Vac. Sci. Technol. 19, 1117-1120 (1981).
    • (1981) J. Vac. Sci. Technol. , vol.19 , pp. 1117-1120
    • Isaacson, M.1    Muray, A.2
  • 6
    • 0027788171 scopus 로고
    • Electron diffraction from gratings fabricated by electron beam nanolithography
    • Ito, Y., Bleloch, A. L., Paterson, J. H. & Brown, L. M. Electron diffraction from gratings fabricated by electron beam nanolithography. Ultramicroscopy 52, 347-352 (1993).
    • (1993) Ultramicroscopy , vol.52 , pp. 347-352
    • Ito, Y.1    Bleloch, A.L.2    Paterson, J.H.3    Brown, L.M.4
  • 9
    • 0022204019 scopus 로고
    • Contamination lithography for the fabrication of zone plate x-ray lenses
    • Buckley, C. J., Browne, M. T. & Charalambous, P. Contamination lithography for the fabrication of zone plate x-ray lenses. Proc. SPIE 537, 213-217 (1985).
    • (1985) Proc. SPIE , vol.537 , pp. 213-217
    • Buckley, C.J.1    Browne, M.T.2    Charalambous, P.3
  • 10
    • 33745947692 scopus 로고
    • Inhibited spontaneous emission in solid-state physics and electronics
    • Yablonovitch, E. Inhibited spontaneous emission in solid-state physics and electronics. Phys. Rev. Lett. 58, 2059-2062 (1987).
    • (1987) Phys. Rev. Lett. , vol.58 , pp. 2059-2062
    • Yablonovitch, E.1
  • 11
    • 0027813745 scopus 로고
    • Fabrication of metallic structures in the 10 nm region using an inorganic electron beam resist
    • Langheinrich, W. & Beneking, H. Fabrication of metallic structures in the 10 nm region using an inorganic electron beam resist. Jpn J. Appl. Phys. 32, 6218-6223 (1993).
    • (1993) Jpn J. Appl. Phys. , vol.32 , pp. 6218-6223
    • Langheinrich, W.1    Beneking, H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.