-
1
-
-
0002170585
-
The theoretical resolution of the electron microscope
-
Scherzer, O. The theoretical resolution of the electron microscope. J. Appl. Phys. 20, 20-29 (1949).
-
(1949)
J. Appl. Phys.
, vol.20
, pp. 20-29
-
-
Scherzer, O.1
-
2
-
-
0006350685
-
-
(ed. Sturgess, J. M.) Microscopical Society of Canada
-
Broers, A. N. et al. in Electron Microscopy 1978 Vol. III (ed. Sturgess, J. M.) 343-354 (Microscopical Society of Canada, 1978).
-
(1978)
Electron Microscopy 1978
, vol.3
, pp. 343-354
-
-
Broers, A.N.1
-
3
-
-
0019636721
-
In-situ vaporization of very low-molecular weight resists using 1-2 nm diameter electron beams
-
Isaacson, M. & Muray, A. In-situ vaporization of very low-molecular weight resists using 1-2 nm diameter electron beams. J. Vac. Sci. Technol. 19, 1117-1120 (1981).
-
(1981)
J. Vac. Sci. Technol.
, vol.19
, pp. 1117-1120
-
-
Isaacson, M.1
Muray, A.2
-
4
-
-
2642647021
-
High resolution electron beam induced desorption
-
Berger, S. D., Macaulay, J. M., Brown, L. M. & Allen, R. M. High resolution electron beam induced desorption. Mater. Res. Soc. Symp. Proc. 129, 515-520 (1989).
-
(1989)
Mater. Res. Soc. Symp. Proc.
, vol.129
, pp. 515-520
-
-
Berger, S.D.1
Macaulay, J.M.2
Brown, L.M.3
Allen, R.M.4
-
5
-
-
0005267498
-
Electron beam writing on a 20-Å scale in metal β-alumina
-
Mochel, M. E., Humphreys, C. J., Eades, J. A., Mochel, J. M. & Petford, A. M. Electron beam writing on a 20-Å scale in metal β-alumina. Appl. Phys. Lett. 42, 392-394 (1983).
-
(1983)
Appl. Phys. Lett.
, vol.42
, pp. 392-394
-
-
Mochel, M.E.1
Humphreys, C.J.2
Eades, J.A.3
Mochel, J.M.4
Petford, A.M.5
-
6
-
-
0027788171
-
Electron diffraction from gratings fabricated by electron beam nanolithography
-
Ito, Y., Bleloch, A. L., Paterson, J. H. & Brown, L. M. Electron diffraction from gratings fabricated by electron beam nanolithography. Ultramicroscopy 52, 347-352 (1993).
-
(1993)
Ultramicroscopy
, vol.52
, pp. 347-352
-
-
Ito, Y.1
Bleloch, A.L.2
Paterson, J.H.3
Brown, L.M.4
-
7
-
-
0005945348
-
Electron phase gratings by electron beam nanolithography
-
Ito, Y., Bleloch, A. L., Granleese, S. J. R. & Brown, L. M. Electron phase gratings by electron beam nanolithography. Inst. Phys. Conf. Ser. 38, 507-510 (1993).
-
(1993)
Inst. Phys. Conf. Ser.
, vol.38
, pp. 507-510
-
-
Ito, Y.1
Bleloch, A.L.2
Granleese, S.J.R.3
Brown, L.M.4
-
8
-
-
21544452397
-
-
(ed. Wolf, E.) Elsevier Science, Amsterdam
-
Nishihara, H. & Suhara, T. Micro Fresnel Lenses. Progress in Optics Vol. XXIV (ed. Wolf, E.) 3-37 (Elsevier Science, Amsterdam, 1987).
-
(1987)
Micro Fresnel Lenses. Progress in Optics
, vol.24
, pp. 3-37
-
-
Nishihara, H.1
Suhara, T.2
-
9
-
-
0022204019
-
Contamination lithography for the fabrication of zone plate x-ray lenses
-
Buckley, C. J., Browne, M. T. & Charalambous, P. Contamination lithography for the fabrication of zone plate x-ray lenses. Proc. SPIE 537, 213-217 (1985).
-
(1985)
Proc. SPIE
, vol.537
, pp. 213-217
-
-
Buckley, C.J.1
Browne, M.T.2
Charalambous, P.3
-
10
-
-
33745947692
-
Inhibited spontaneous emission in solid-state physics and electronics
-
Yablonovitch, E. Inhibited spontaneous emission in solid-state physics and electronics. Phys. Rev. Lett. 58, 2059-2062 (1987).
-
(1987)
Phys. Rev. Lett.
, vol.58
, pp. 2059-2062
-
-
Yablonovitch, E.1
-
11
-
-
0027813745
-
Fabrication of metallic structures in the 10 nm region using an inorganic electron beam resist
-
Langheinrich, W. & Beneking, H. Fabrication of metallic structures in the 10 nm region using an inorganic electron beam resist. Jpn J. Appl. Phys. 32, 6218-6223 (1993).
-
(1993)
Jpn J. Appl. Phys.
, vol.32
, pp. 6218-6223
-
-
Langheinrich, W.1
Beneking, H.2
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