Concentration profiles in densely tethered polymer brushes

Macromolecules

Volumn 31, Issue 11, 1998, Pages 3731-3734

  Levicky, Rastislav ^a,c   Koneripalli, Nagraj ^a,d   Tirrell, Matthew ^a   Satija, Sushil K ^b  

^a University of Minnesota ^*  (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^d 3M COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BLOCK COPOLYMERS; COMPUTER SIMULATION; MOLECULAR STRUCTURE; MONOLAYERS; NEUTRON REFLECTION; PLASTIC FILMS; POLYSTYRENES; SYNTHESIS (CHEMICAL); TOLUENE; VINYL RESINS; VOLUME FRACTION;

POLYMER BRUSHES; SELF CONSISTENT MEAN FIELD THEORY; SPIN COATING;

MACROMOLECULES;

EID: 0032474378     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma9717653     Document Type: Article

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