MOVPE growth of InGaAsP/InP-based vertical-cavity structures for wafer-fused VCSELs

Journal of Crystal Growth

Volumn 187, Issue 1, 1998, Pages 35-41

  Amano, C ^a   Itoh, Y ^a   Ohiso, Y ^a   Takenouchi, H ^a   Tadokoro, T ^a   Kurokawa, T ^a  

^a NTT CORPORATION   (Japan)

Author keywords

DBR; InGaAsP; MOCVD; MOVPE; VCSEL

Indexed keywords

CAVITY RESONATORS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLORGANIC VAPOR PHASE EPITAXY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR GROWTH; SEMICONDUCTOR QUANTUM WELLS;

DISTRIBUTED BRAGG REFLECTORS (DBR); VERTICAL CAVITY SURFACE EMITTING LASERS (VCSEL);

SEMICONDUCTOR LASERS;

EID: 0032473723     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00841-5     Document Type: Article

References (13)

1. T.E. Sale, Vertical Cavity Surface Emitting Lasers, Research Studies Press, Taunton, 1995, p. 20.
2. T. Kurokawa, T. Ikegami, Proc. 3rd Int. Conf. on Massively Parallel Processing Using Optical Interconnections, October 1996, Hawaii, p. 300.
3. Y. Kohama, Y. Ohiso, C. Amano, T. Kurokawa, Inst. Phys. Conf. Ser. 141 (1995) 559.
4. H. Saito, I. Ogura, Y. Sugimoto, K. Kasahara, Appl. Phys. Lett. 66 (1995) 2466.
5. T. Tadokoro, H. Okamoto, Y. Kohama, T. Kawakami, T. Kurokawa, IEEE Photon. Technol. Lett. 4 (1992) 409.
6. K. Streubel, S. Rapp, J. André, J. Wallin, IEEE Photon. Technol. Lett. 8 (1996) 1121.
7. S. Uchiyama, N. Yokouchi, T. Ninomiya, IEEE Photon. Technol. Lett. 9 (1997) 141.
8. K. Uomi, S.J.B. Yoo, A. Scherer, R. Bhat, N.C. Andreadaski, C.E. Zah, M.A. Koza, T.P. Lee, IEEE Photon. Technol. Lett. 6 (1994) 317.
9. M.A. Fisher, Y.-Z. Huang, A.J. Dann, D.J. Elton, M.J. Harlow, S.D. Perrin, J. Reed, I. Reid, M.J. Adams, IEEE Photon. Technol. Lett. 7 (1995) 608.
10. D.I. Babic, K. Streubel, R.P. Mirin, N.M. Margalit, J.E. Bowers, E.L. Hu, D.E. Mars, L. Yang, K. Carey, IEEE Photon. Technol. Lett 7 (1995) 1225.
11. Y. Qian, Z.H. Zhu, Y.H. Lo, D.L. Huffaker, D.G. Deppe, H.Q. Hou, B.E. Hammons, W. Lin, Y.K. Tu, Electron. Lett. 33 (1997) 1052.
12. Y. Ohiso, C. Amano, Y. Itoh, K. Tateno, T. Tadokoro, H. Takenouchi, T. Kurokawa, Electron. Lett. 32 (1996) 1483.
13. R.A. Morgan, M.K. Hibbs-Brenner, T.M. Marta, R.A. Walterson, S. Bounnak, E.L. Kalweit, J.A. Lehman, IEEE Photon. Technol. Lett. 7 (1995) 441.