Patterning of a polysiloxane precursor to silicate glasses by microcontact printing

Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 9-12

  Marzolin, Christian ^a   Terfort, Andreas ^a   Tien, Joe ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

Glass photoresist; Microcontact printing; Polysiloxane

Indexed keywords

PHOTOLITHOGRAPHY; PHOTORESISTS; REACTIVE ION ETCHING; SEMICONDUCTING GLASS; SEMICONDUCTING POLYMERS; SILICA; SILICONES; THIN FILMS;

GLASS PHOTORESISTS; MICROCONTACT PRINTING;

SEMICONDUCTING FILMS;

EID: 0032473276     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00682-2     Document Type: Article

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