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Volumn 10, Issue 4, 1998, Pages 741-752
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Angular, energy and charge distribution in the scattering of low-energy helium ions by an amorphous silicon surface
a a b a b a a,b |
Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
CALCULATIONS;
COMPUTER SIMULATION;
ELECTRONIC DENSITY OF STATES;
HELIUM;
ION EXCHANGE;
IONS;
NUMERICAL METHODS;
SCATTERING;
ANGULAR DISTRIBUTION;
AUGER NEUTRALIZATION;
CHARGE DISTRIBUTION;
CHARGE FRACTION;
ELECTRONIC STOPPING POWER;
ENERGY DISTRIBUTION;
ION SCATTERING;
LOW ENERGY ION SPECTROSCOPY;
SURFACES;
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EID: 0032472666
PISSN: 09538984
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-8984/10/4/004 Document Type: Article |
Times cited : (7)
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References (32)
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