Photoacid generator study for a chemically-amplified negative resist for high resolution lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 568-579

  Dentinger, Paul M ^a   Knapp, Kurtis G ^a   Reynolds, Geoffrey W ^a   Taylor, James W ^a   Fedynyshyn, Theodore H ^a   Richardson, Todd A ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Chemically amplified photoresist; FTIR; Photoacid generator; Sulfonate; Triflate; X ray lithography

Indexed keywords

ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SPECTROPHOTOMETRY; SURFACE ROUGHNESS; TITRATION; X RAYS;

CHEMICALLY-AMPLIFIED RESISTS; HIGH RESOLUTION LITHOGRAPHY;

PHOTORESISTS;

EID: 0032403799     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309618     Document Type: Conference Paper

References (21)