Scattering and coherence in EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 537-543

  Milster, Tom D ^a   Beaudry, Neil A ^a  

^a UNIVERSITY OF ARIZONA   (United States)

Author keywords

Coherence; Extreme ultraviolet lithography; Scattering

Indexed keywords

AMPLITUDE MODULATION; COHERENT LIGHT; LITHOGRAPHY; MASKS; SPURIOUS SIGNAL NOISE; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUV);

SCATTERING;

EID: 0032402857     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309613     Document Type: Conference Paper

References (2)