Contamination monitoring for ammonia, amines and acid gases utilizing ion mobility spectroscopy (IMS)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 550-559

  Bacon, Tad ^a   Webber, Kurt ^a   Carpio, Ronald ^a  

^a Molecular Analytics   (United States)

Author keywords

Amines; Ammonia; Analyzer; Contamination; DUV; Ion mobility spectroscopy; Lithography; NMP; Topping

Indexed keywords

AMINES; AMMONIA; CHEMICAL MECHANICAL POLISHING; CONTAMINATION; MATERIALS TESTING; SEMICONDUCTOR DEVICE MANUFACTURE; SPECTROSCOPY;

ION MOBILITY SPECTROSCOPY;

PHOTORESISTS;

EID: 0032401539     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308766     Document Type: Conference Paper

References (3)

1. Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
2. The effects of an organic base in chemically amplified resists on pattering characteristics using KRF lithography
3. Contamination of positive deep-UV photoresists