Dynamic characterization of step-induced vibrations of x-ray mask membranes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 629-637

  Schlax, Michael P ^a   Engelstad, Roxann L ^a   Lovell, Edward G ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Damping; Lithography; Membrane; Noncontact; Vibration; X ray

Indexed keywords

COMPRESSIBILITY; DAMPING; MEMBRANES; SILICON NITRIDE; VIBRATIONS (MECHANICAL); X RAY LITHOGRAPHY;

VISCOUS EFFECTS;

MASKS;

EID: 0032401369     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309626     Document Type: Conference Paper

References (8)

1. Vibratory analysis of an X-ray mask membrane during stepping
2. Capacitively activated torsional high-Q resonator
3. Effect of air damping on the dynamics of nonuniform deformations of microstructures
4. Model for gas film damping in a silicon accelerometer
5. Analytical modeling of squeeze-film damping in accelerometers
6. Isothermal squeeze films
7. Squeeze-film damping in solid-state accelerometers
8. Squeeze film dampers: Amplitude effects at low squeeze numbers