Crystalline structure of YSZ thin films deposited on Si(111) substrate by chemical vapor deposition

Korean Journal of Chemical Engineering

Volumn 15, Issue 3, 1998, Pages 243-245

  Hwang, Sang Chul ^a   Lee, Hee Gyoun ^b   Shin, Hyung Shik ^a  

^a Chonbuk National University   (South Korea)

^b Korea Atomic Energy Research Institute   (South Korea)

Author keywords

CVD; Si substrate; XPS; XRD; YSZ Thin Film

Indexed keywords

EID: 0032398691     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02707078     Document Type: Article

References (6)

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