Quantum confinement in InSb microcrystallites embedded in SiO2 thin films

Chinese Physics Letters

Volumn 15, Issue 2, 1998, Pages 143-145

  Zhu, Kai Gui ^a   Shi, Jian Zhong ^a   Zhang, Li De ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ANTIMONY COMPOUNDS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; III-V SEMICONDUCTORS; INDIUM ANTIMONIDES; NARROW BAND GAP SEMICONDUCTORS; QUANTUM CONFINEMENT; SILICA; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION EDGES; ANNEALING TIME; AVERAGE SIZE; BLUE SHIFT; CO-SPUTTERING TECHNIQUES; MICRO CRYSTALLITE; ORDERS OF MAGNITUDE; POSTANNEALING TEMPERATURES; THIN-FILMS; X-RAY PHOTOELECTRONS;

THIN FILMS;

EID: 0032394050     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/15/2/024     Document Type: Article

References (14)

1. A. I. Ekimov and A. A. Onushchenko, Sov. Phys. Semicond. 16(1982) 775.
2. A. I. Ekimov, Al. L. Efros and A. A. Onushchenko, Solid State Commun. 56 (1985) 921.
3. L. E. Brus, IEEE J. Quantum Electron. QE-22 (1986) 1909.
4. R. K. Jain and R. C. Lind, J. Opt. Soc. Am. 73 (1983) 647.
5. P. E. Lippen and M. Lannoo, Phys. Rev. B 41 (1990) 6097.
6. K. I. Kang, B. P. McGinnis, Sundaphon, Y. Z. Hu, S. W. Koch and N. Penghambarin, Phys. Rev. B 45 (1992) 465.
7. L. M. Ramanish and S. V. Nair, Phys. Rev. B 47 (1993) 7132.
8. C. Kittle, Introduction to Solid State Physics, 5-th ed. (Willey, New York, 1976) p. 233.
9. Brian R. Bennett, B. V. Shanabrook and R. Mayno, Appl. Phys. Lett. 68 (1996) 958.
10. T. Utzmeier, P. A. Postigo, J. Tamayo, R. Garcia and F. Briones, Appl. Phys. Lett. 69 (1996) 2674.
11. J. G. Ferrer, F. Peiro, A. Cornet and J. R. Morante, Appl. Phys. Lett. 69 (1996) 3887.
12. A. Taylor, X-Ray Metallography (Willey, New York, 1961) p. 674.
13. L. E. Bras, J. Phys. Chem. 79 (1983) 5566;
14. 80 (1984) 4403.