Ion bombardment of amorphous silicon films during plasma-enhanced chemical vapor deposition in an rf discharge

Technical Physics

Volumn 43, Issue 2, 1998, Pages 180-187

  Abramov, A S ^a   Vinogradov, A Ya ^a   Kosarev, A I ^a   Shutov, M V ^a   Smirnov, A S ^b   Orlov, K E ^b  

^a IOFFE INSTITUTE   (Russian Federation)

^b PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032379642     PISSN: 10637842     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1258964     Document Type: Article

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