-
2
-
-
0004393375
-
-
Y. Matsumiya, K. Kitahara, N. Ohtsuka, and K. Nakajima, Jpn. J. Appl. Phys., Part 2 34, L17 (1995).
-
(1995)
Jpn. J. Appl. Phys., Part 2
, vol.34
-
-
Matsumiya, Y.1
Kitahara, K.2
Ohtsuka, N.3
Nakajima, K.4
-
3
-
-
0347985800
-
-
M. E. Gross, C. G. Fleming, K. P. Cheung, and L. A. Heimbrook, J. Appl. Phys. 69, 2589 (1991).
-
(1991)
J. Appl. Phys.
, vol.69
, pp. 2589
-
-
Gross, M.E.1
Fleming, C.G.2
Cheung, K.P.3
Heimbrook, L.A.4
-
5
-
-
36549102546
-
-
K. Tsubouchi, K. Masu, N. Shigeeda, T. Matano, Y. Hiura, and N. Mikoshiba, Appl. Phys. Lett. 57, 1221 (1990).
-
(1990)
Appl. Phys. Lett.
, vol.57
, pp. 1221
-
-
Tsubouchi, K.1
Masu, K.2
Shigeeda, N.3
Matano, T.4
Hiura, Y.5
Mikoshiba, N.6
-
6
-
-
84953680788
-
-
M. G. Simmonds, W. L. Gladfelter, R. Nagaraja, W. W. Szymanski, K.-H. Ahn, and P. H. McMurry, J. Vac. Sci. Technol. A 9, 2782 (1991).
-
(1991)
J. Vac. Sci. Technol. A
, vol.9
, pp. 2782
-
-
Simmonds, M.G.1
Gladfelter, W.L.2
Nagaraja, R.3
Szymanski, W.W.4
Ahn, K.-H.5
McMurry, P.H.6
-
12
-
-
0027677819
-
-
K.-I. Hanaoka, H. Ohnishi, and K. Tachibana, Jpn. J. Appl. Phys., Part 1 32, 4774 (1993).
-
(1993)
Jpn. J. Appl. Phys., Part 1
, vol.32
, pp. 4774
-
-
Hanaoka, K.-I.1
Ohnishi, H.2
Tachibana, K.3
-
14
-
-
0029327113
-
-
A. E. Kaloyeros, B. Zheng, I. Lou, J. Lau, and J. W. Hellgeth, Thin Solid Films 262, 20 (1995).
-
(1995)
Thin Solid Films
, vol.262
, pp. 20
-
-
Kaloyeros, A.E.1
Zheng, B.2
Lou, I.3
Lau, J.4
Hellgeth, J.W.5
-
15
-
-
0002701123
-
-
J. E. Butler, N. Bottka, R. S. Sillmon, and D. K. Gaskill, J. Cryst. Growth 77, 163 (1986).
-
(1986)
J. Cryst. Growth
, vol.77
, pp. 163
-
-
Butler, J.E.1
Bottka, N.2
Sillmon, R.S.3
Gaskill, D.K.4
-
16
-
-
0026926240
-
-
T. Kawahara, A. Yuuki, and Y. Matsui, Jpn. J. Appl. Phys., Part 1 31, 2925 (1992).
-
(1992)
Jpn. J. Appl. Phys., Part 1
, vol.31
, pp. 2925
-
-
Kawahara, T.1
Yuuki, A.2
Matsui, Y.3
-
18
-
-
0030164387
-
-
J.-W. Soh, S.-S. Jang, I.-S. Jeong, and W.-J. Lee, Thin Solid Films 279, 17 (1996).
-
(1996)
Thin Solid Films
, vol.279
, pp. 17
-
-
Soh, J.-W.1
Jang, S.-S.2
Jeong, I.-S.3
Lee, W.-J.4
-
19
-
-
0023419879
-
-
F. Hasegawa, T. Takahashi, K. Kubo, and Y. Nannichi, Jpn. J. Appl. Phys., Part 1 26, 1555 (1987).
-
(1987)
Jpn. J. Appl. Phys., Part 1
, vol.26
, pp. 1555
-
-
Hasegawa, F.1
Takahashi, T.2
Kubo, K.3
Nannichi, Y.4
-
22
-
-
0003466921
-
-
Prentice-Hall, Englewood Cliffs, NJ
-
H. S. Fogler, Elements of Chemical Reaction Engineering, 2nd ed. (Prentice-Hall, Englewood Cliffs, NJ, 1992), p. 11.
-
(1992)
Elements of Chemical Reaction Engineering, 2nd Ed.
, pp. 11
-
-
Fogler, H.S.1
-
23
-
-
0342494313
-
-
G. N. Nechiporenko, L. B. Petukhova, and A. S. Rozenberg, Izv. Akad. Nauk. SSSR, Ser. Khi. 8, 1697 (1975).
-
(1975)
Izv. Akad. Nauk. SSSR, Ser. Khi.
, vol.8
, pp. 1697
-
-
Nechiporenko, G.N.1
Petukhova, L.B.2
Rozenberg, A.S.3
-
24
-
-
0000061857
-
-
D. M. Frigo, G. J. M. van Eijden, P. J. Reuvers, and C. J. Smit, Chem. Mater. 6, 190 (1994).
-
(1994)
Chem. Mater.
, vol.6
, pp. 190
-
-
Frigo, D.M.1
Van Eijden, G.J.M.2
Reuvers, P.J.3
Smit, C.J.4
-
26
-
-
84913078842
-
-
M. G. Simmonds, W. L. Gladfelter, H. Li, and P. H. McMurry, J. Vac. Sci. Technol. A 11, 3026 (1993).
-
(1993)
J. Vac. Sci. Technol. A
, vol.11
, pp. 3026
-
-
Simmonds, M.G.1
Gladfelter, W.L.2
Li, H.3
McMurry, P.H.4
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