High energy aluminum ion implantation using a variable energy radio frequency quadrupole implanter

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 2, 1998, Pages 472-476

  Amemiya, Kensuke ^a   Ito, Junya ^a   Tokiguchi, Katsumi ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032370874     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581045     Document Type: Article

References (15)

1. D. Pramanik and M. I. Current, Solid State Technol. 27, 211 (1984).
2. J. F. Ziegler, Nucl. Instrum. Methods Phys. Res. B 6, 270 (1985).
3. K. Tsukamoto, S. Komori, T. Kuroi, and Y. Akasaka, Nucl. Instrum. Methods Phys. Res. B 59/60, 584 (1991).
4. H.-Y. Lin and C. H. Ting, Nucl. Instrum. Methods Phys. Res. B 37/38, 960 (1989).
5. M. R. Wordeman, R. H. Dennard, and G. A. Sai-Halasz, IEEE Trans. Electron Devices ED-81, 40 (1981).
6. K. Tokiguchi, K. Amemiya, H. Koike, N. Sakudo, and T. Seki, Vacuum 38, 487 (1988).
7. K. Amemiya, K. Tokiguchi, and N. Sakudo, J. Vac. Sci. Technol. A 9, 307 (1991).
8. K. Amemiya, K. Tokiguchi, H. Koike, T. Seki, and N. Sakudo, Nucl. Instrum. Methods Phys. Res. B 37/38, 87 (1989).
9. K. Amemiya, K. Tokuguchi, Y. Hakamata, and N. Sakudo, Nucl. Instrum. Methods Phys. Res. B 55, 339 (1991).
10. K. Tokiguchi, K. Amemiya, H. Koike, T. Seki, N. Sakudo, S. Yamada, and Y. Hirao, Nucl. Instrum. Methods Phys. Res. B 37/38, 253 (1989).
11. Y. Hakamata, K. Amemiya, K. Tokiguchi, N. Sakudo, S. Yamada, Y. Hirao, and N. Tokuda, Nucl. Instrum. Methods Phys. Res. B 56/57, 1046 (1991).
12. K. Amemiya, K. Tokiguchi, Y. Hakamata, S. Yamada, Y. Hirao, and N. Tokuda, J. Vac. Sci. Technol. A 12, 399 (1994).
13. K. Amemiya, J. Ito, K. Tokiguchi, T. Sato, N. Sakudo, S. Yamada, Y. Hirao, and N. Tokuda, Ion Implantation Technology-94, edited by S. Coffa, G. Ferla, F. Priolo, and E. Rimini (Elsevier Science/North-Holland, Amsterdam, The Netherlands, 1995), pp. 450-453.
14. J. F. Ziegler, Handbook of Ion Implantation Technology, edited by J. F. Ziegler (Elsevier Science/North-Holland, Amsterdam, The Netherlands, 1992), pp. 1-15.
15. O. Kamigaito, A. Goto, Y. Miyazawa, T. Chiba, M. Hemmi, M. Kase, and Y. Yano, Jpn. J. Appl. Phys., Part 2 33, L537 (1994).