The characteristics of an amorphous Se 75Ge 25 thin film as a positive-type resist in focused-ion-beam lithography

Journal of the Korean Physical Society

Volumn 32, Issue 2, 1998, Pages 171-175

  Lee, Hyunyong ^a   Chung, Hongbay ^a  

^a Kwangwoon University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032364309     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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