In situ studies of metal-semiconductor interactions with synchrotron radiation

Journal of Synchrotron Radiation

Volumn 5, Issue 3, 1998, Pages 1050-1051

  Sayers, D E ^a   Goeller, P T ^b   Boyanov, B I ^a   Nemanich, R J ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b North Carolina State University   (United States)

Author keywords

EXAFS; Metal semiconductor contacts; Molecular beam epitaxy; Silicon germanium alloys

Indexed keywords

EID: 0032361778     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049597015240     Document Type: Article

References (3)

1. Boyanov, B. I., Goeller, P. T., Sayers, D. E. & Nemanich, R. J. (1997). Appl. Phys. Lett. 71, 3060-3062.
2. Meyerheim, H. L., Döbler, U. & Puschmann, A. (1991). Phys. Rev. B, 44, 5739-5744.
3. Stalder, R., Schwarz, C., Sirringhaus, H. & von Känel, H. (1992). Surf. Sci. 271, 355-375.