Characteristics of PZT/STO/Si thin films for MFIS structure by RF magnetron sputtering

Journal of the Korean Physical Society

Volumn 32, Issue 4 SUPPL., 1998, Pages

  Park, Sang Tae ^a   Shin, Dong Suk ^a   Choi, In Hoon ^a  

^a Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032361040     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. Suk-Ki Min, Physics & Technology 9, (1994), in Korean.
2. Eisuke Tokumutsu, Kensuke Itani, Bum-Ki Moon and Hiroshi Ishiwara, Jpn. J. Appl. Phys, 34, 5202 (1995).
3. Yushi Shichi, Satoshi Tanimoto, Takaki Goto, Koichi Kuroiwa and Yasuo Tarui, Jpn. J. Appl. Phys. 33, 5172 (1994).
4. H. Ishiwara, FED Journal 7, 13 (1996).
5. B. K. Moon and H. Ishiwara, Mater. Res. Soc. Symp. Proc. 341, 113 (1994).
6. Bum Ki Moon and Hhiroshi Ihiwara, Jpn. J. Appl. Phys. 33, 1472 (1994).
7. Bum Ki Moon and Hiroshi Ishiwara, Jpn. J. Appl. Phys. 33, 5911 (1994).
8. Hiroshi Maiwa, Noborow Ichinose and Kiyoshi Okazaki, Jpn. J. Appl. Phys. 34, 5136 (1995).
9. D. M. Smyth, Ferroelectrics 116, 117 (1991).