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Volumn 14, Issue 4, 1998, Pages 769-778

Effect of the Surface Treatment of a Graphite Furnace with a Refractory Element (Hafnium, Titanium, Tungsten and Zirconium) by a One-Drop Coating Method on the Atomization Mechanism of Indium in Electrothermal Atomic Absorption Spectrometry

Author keywords

Atomization mechanism; Carbide coating; Electrothermal atomic absorption spectrometry; Indium; Raman spectrometry; Surface treatment

Indexed keywords

ABSORPTION SPECTROSCOPY; ACTIVATION ENERGY; ATOMIC ABSORPTION SPECTROMETRY; ATOMIZATION; ATOMS; CARBIDES; COATINGS; CRYSTALLITES; DROPS; ELECTRIC HEATING; FURNACES; GRAPHITE; HAFNIUM; INDIUM; INDIUM COMPOUNDS; REFRACTORY MATERIALS; TITANIUM; TUNGSTEN; ZIRCONIUM;

EID: 0032359805     PISSN: 09106340     EISSN: None     Source Type: Journal    
DOI: 10.2116/analsci.14.769     Document Type: Article
Times cited : (6)

References (33)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.