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Volumn 14, Issue 4, 1998, Pages 769-778
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Effect of the Surface Treatment of a Graphite Furnace with a Refractory Element (Hafnium, Titanium, Tungsten and Zirconium) by a One-Drop Coating Method on the Atomization Mechanism of Indium in Electrothermal Atomic Absorption Spectrometry
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Author keywords
Atomization mechanism; Carbide coating; Electrothermal atomic absorption spectrometry; Indium; Raman spectrometry; Surface treatment
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Indexed keywords
ABSORPTION SPECTROSCOPY;
ACTIVATION ENERGY;
ATOMIC ABSORPTION SPECTROMETRY;
ATOMIZATION;
ATOMS;
CARBIDES;
COATINGS;
CRYSTALLITES;
DROPS;
ELECTRIC HEATING;
FURNACES;
GRAPHITE;
HAFNIUM;
INDIUM;
INDIUM COMPOUNDS;
REFRACTORY MATERIALS;
TITANIUM;
TUNGSTEN;
ZIRCONIUM;
ARRHENIUS ACTIVATION ENERGY;
ATOMIZATION MECHANISM;
CARBIDE COATING;
ELECTROTHERMAL ATOMIC ABSORPTION SPECTROMETRY;
GRAPHITE CRYSTALLITES;
RAMAN SPECTROMETRIES;
RATE DETERMINING STEP;
SENSITIVITY ENHANCEMENTS;
SURFACE TREATMENT;
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EID: 0032359805
PISSN: 09106340
EISSN: None
Source Type: Journal
DOI: 10.2116/analsci.14.769 Document Type: Article |
Times cited : (6)
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References (33)
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