Hydrazine cyanurate as a nitrogen source for thin nitride film growth

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 1, 1998, Pages 139-144

  Kropewnicki, Thomas J ^a   Kohl, Paul A ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032350135     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580960     Document Type: Article

References (26)

1. A. Marwitz, H. Baumann, E. F. Krimmel, K. Bethge, P. Misaelides, and S. Logothetidis, Vacuum 44, 367 (1993).
2. CRC Handbook of Chemistry and Physics (CRC, Boca Raton, FL, 1993).
3. Y. T. Kom, C. W. Lee, and S.-K. Min, Jpn. J. Appl. Phys., Part 1 32, 6126 (1993).
4. A. Arnigliato, M. Finetti, S. Guerri, P. Ostoja, S. Scorzoni, and J. Garrido, Thin Solid Films 140, 173 (1986).
5. E. S. Aydil, K. P. Giapis, R. A. Gottscho, V. M. Donnelly, and E. Yoon, J. Vac. Sci. Technol. B 11, 195 (1993).
6. Properties of Group III Nitrides (INSPEC, London, 1994).
7. S. Strife and H. Morkoç, J. Vac. Sci. Technol. B 10, 1237 (1992).
8. H. Morkoç, International Symposium on Blue Laser and Light Emitting Diodes, Chiba University, Japan, 5-7 March 1996 (unpublished).
9. Lange's Handbook of Chemistry, 14th ed. (McGraw-Hill, New York, 1992).
10. D. Oberman, H. Lee, W. Götz, and J. Harris, Jr., J. Cryst. Growth 150, 912 (1995).
11. T. S. Cheng, L. C. Jenkins, S. E. Hooper, C. T. Foxon, J. W. Orton, and D. E. Lacklison, Appl. Phys. Lett. 66, 20 (1995).
12. H. Morkoç, A. Botchharev, A. Salvador, and B. Sverdlov, J. Cryst. Growth 150, 887 (1995).
13. J. M. Van Hove, G. J. Cosimini, E. Nelson, A. M. Wowchak, and P. P. Chow, J. Cryst. Growth 150, 908 (1995).
14. H. Tsuchiya, A. Takeuchi, M. Kurihara, and F. Hasegawa, J. Cryst. Growth 152, 21 (1995).
15. S. Fujieda, M. Mizuta, and Y. Matsumoto, Jpn. J. Appl. Phys., Part 1 26, 2067 (1987).
16. K. Vogt, Ph.D. thesis, Georgia Institute of Technology, 1994 (unpublished).
17. D. Gaskill, N. Bottka, and M. Lin, J. Cryst. Growth 77, 418 (1986).
18. Kirk-Othmer Encyclopedia of Chemical Technology, 3rd ed. (Wiley, New York, 1980), Vol. 12.
19. E. Apen and J. L. Gland, Surf. Sci. 321, 308 (1994).
20. D. J. Alberas, J. Kiss, Z.-M. Liu, and J. M. White, Surf. Sci. 278, 51 (1992).
21. J. Prasad and J. L. Gland, Langmuir 7, 722 (1991).
22. M. Grunze, Surf. Sci. 81, 603 (1979).
23. C. Good and D. Poole, US Patent No. 3,598,546 (1971).
24. D. Gaskill, N. Bottka, and M. Lin, Appl. Phys. Lett. 48, 1449 (1986).
25. E. Nachbaur and G. Leiseder, Monatsch. Chem. 102, 1718 (1971).
26. Th. Allinger, J. A. Schaefer, Ch. Stuhlmann, U. Beckers, and H. Ibach, Physica B 170, 481 (1991).