Electromigration study of Al/low dielectric constant polymer and Al/SiO2 dioxide line structures

Journal of Applied Physics

Volumn 84, Issue 11, 1998, Pages 6007-6016

  Wang, Pei Hua ^a,c   Ho, Paul S ^a   Pellerin, John ^b,d   Fox, Robert ^b  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b SEMATECH   (United States)

^c INTEL CORPORATION   (United States)

^d ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; BACKSCATTERING; ELECTRIC VARIABLES MEASUREMENT; ELECTRON DIFFRACTION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; HIGH TEMPERATURE OPERATIONS; ORGANIC POLYMERS; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SILICA; X RAY DIFFRACTION;

ELECTRON BACKSCATTERING DIFFRACTION; POLYARYLENE ETHER; TETRAETHYL ORTHOSILICATE; VOID MORPHOLOGY;

ELECTROMIGRATION;

EID: 0032343783     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368897     Document Type: Article

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