High-rate deposition of cBN films by ion-beam-assisted vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 6, 1998, Pages 3287-3294

  Sueda, Minoru ^a   Kobayashi, Toshiro ^a   Rokkaku, Tadashi ^a   Ogawa, Makoto ^a   Watanabe, Toshiya ^a   Morimoto, Satoshi ^a  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032335988     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581535     Document Type: Article

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