Conduction Mechanism in RuO2-Based Thick Films

Physica Status Solidi (B) Basic Research

Volumn 205, Issue 1, 1998, Pages 399-404

  Flachbart, K ^a   Pavlik V ^a   Tomasovicova N ^a   Adkins, C J ^b   Somora, M ^c   Leib, J ^d   Eska, G ^d  

^a INSTITUTE OF EXPERIMENTAL PHYSICS   (Slovakia)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c TECHNICAL UNIVERSITY OF KO ICE   (Slovakia)

^d UNIVERSITY OF BAYREUTH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032331506     PISSN: 03701972     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-3951(199801)205:1<399::AID-PSSB399>3.0.CO;2-X     Document Type: Article

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