Pt-silicide source and drain SOI-MOSFET operating in bi-channel modes

Annual Device Research Conference Digest

Volumn , Issue , 1998, Pages 74-75

  Nishisaka, Mika ^a   Ochiai, Yasuhiro ^a   Asano, Tanemasa ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; ELECTRON EMISSION; ELECTRON TUNNELING; GATES (TRANSISTOR); PLATINUM; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR JUNCTIONS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; THICK FILMS; TRANSCONDUCTANCE;

DRAIN; SCHOTTKY CONTACT; SOURCE;

MOSFET DEVICES;

EID: 0032319113     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)