Evaluation of electrical properties and SIMS profiles on forming gas(N2-H2) annealed Pt/PZT/Pt capacitors

Integrated Ferroelectrics

Volumn 21, Issue 1 -4 pt 1, 1998, Pages 97-105

  Ashida, Hiroshi ^a   Tomotani, Miki ^a   Tamura, Tetsuro ^a   Matsuura, Katsuyoshi ^a   Goto, Yasuyuki ^a   Otani, Seigen ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANNEALING; DEGRADATION; ELECTRIC POTENTIAL; FERROELECTRIC MATERIALS; HYDROGEN; HYSTERESIS; NITROGEN; OXYGEN; POLARIZATION; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING LEAD COMPOUNDS;

FORMING GAS ANNEALING;

ELECTROLYTIC CAPACITORS;

EID: 0032318333     PISSN: 10584587     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1080/10584589808202054     Document Type: Article

References (7)